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Diamond and Related Materials

Volumn 6, Issue 11, 1997, Pages 1606-1611

a-SiC:H films deposited by PECVD from silane + acetylene and silane + acetylene + hydrogen gas mixture

(4) Giorgis, F a Pirri, C F a Tresso, E a Rava, P b

a POLITECNICO DI TORINO (Italy)

b Elettrorava spa Savonera (Italy)

Author keywords

Hydrogenated silicon carbon films; Low defect films; Plasma enhanced chemical vapour deposition; UHV

Indexed keywords

EID: 0041637180 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/s0925-9635(97)00031-9 Document Type: Article

Times cited : (15)

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