Infrared spectroscopy and transmission electron microscopy of polycrystalline silicon carbide

Materials Science in Semiconductor Processing

Volumn 4, Issue 1-3, 2001, Pages 201-204

  Dkaki, M ^a   Calcagno, L ^a   Makthari, A M ^a   Raineri, V ^b  

^a UNIVERSITY OF CATANIA   (Italy)

^b CNR IMETEM   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL MICROSTRUCTURE; CRYSTALLIZATION; INFRARED SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SILICON CARBIDE; TRANSMISSION ELECTRON MICROSCOPY;

BROAD ABSORPTION BAND;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0035247737     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(00)00113-X     Document Type: Article

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