The etching properties of SBT thin films in BCl3/Cl 2/Ar plasma

Thin Solid Films

Volumn 459, Issue 1-2, 2004, Pages 76-81

  Kim, Dong Pyo ^a   Yeo, Ji Won ^a   Kim, Chang Il ^a  

^a Chung Ang University   (South Korea)

Author keywords

ICP; OES; SBT; XPS

Indexed keywords

ADDITION REACTIONS; BORON COMPOUNDS; ETCHING; INDUCTIVELY COUPLED PLASMA; SPUTTERING; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

OPTICAL EMISSION SPECTROSCOPY (OES); PHYSICAL SPUTTERING;

STRONTIUM COMPOUNDS;

EID: 2942564255     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.12.101     Document Type: Conference Paper

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