Plasma etching damage to ferroelectric SrBi2Ta2O9 (SBT) thin films and capacitors

Materials Research Society Symposium - Proceedings

Volumn 596, Issue , 2000, Pages 155-159

  Cho, Jun Hee ^a   Kwon, Il Young ^a   Park, Chanro ^a   Choi, Chang Ju ^a   Seol, Yeo Song ^a   Pyun, D S ^a   Choi, Il Hyun ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CAPACITORS; ELECTRIC PROPERTIES; ELECTROMAGNETIC WAVE POLARIZATION; FERROELECTRIC DEVICES; HYSTERESIS; PLASMA ETCHING; REACTIVE ION ETCHING; SPUTTERING; STRONTIUM COMPOUNDS; SURFACE STRUCTURE; X RAY PHOTOELECTRON SPECTROSCOPY;

FERROELECTRIC CAPACITORS; FERROELECTRIC THIN FILMS; PLASMA ETCHING DAMAGE; REMANENT POLARIZATION; STRONTIUM BISMUTH TANTALATE; VOLTAGE SHIFT;

FERROELECTRIC MATERIALS;

EID: 0033695493     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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