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Volumn 385, Issue 1-2, 2001, Pages 162-166

The etching characteristics of SrBi2Ta2O9 thin film in CF4/Ar plasma using magnetically enhanced inductively coupled plasma

(2) Kim, Dong Pyo a Kim, Chang Il a

a Chung Ang University (South Korea)

Author keywords

MEICP; Plasma etching; SIMS; Srbi2Ta2O9; XPS

Indexed keywords

ARGON; FLUOROCARBONS; INDUCTIVELY COUPLED PLASMA; ION BOMBARDMENT; PLASMA ETCHING; SECONDARY ION MASS SPECTROMETRY; STRONTIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

BIAS VOLTAGE; CHAMBER PRESSURE; MAGNETICALLY ENHANCED INDUCTIVELY COUPLED PLASMA;

THIN FILMS;

EID: 0035311375 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)00761-1 Document Type: Article

Times cited : (6)

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