The surface reaction on SrBi2Ta2O9 thin films etched in Cl2/CF4/Ar inductively coupled plasma

Microelectronic Engineering

Volumn 63, Issue 4, 2002, Pages 373-379

  Kim, Dong Pyo ^a   Kim, Chang Il ^a  

^a Chung Ang University   (South Korea)

Author keywords

Inductively coupled plasma (ICP); Plasma etching; Secondary ion mass spectrometry (SIMS); SrBi2Ta2O9; X ray photoelectron spectroscopy (XPS)

Indexed keywords

INDUCTIVELY COUPLED PLASMA; PLASMA ETCHING; REACTIVE ION ETCHING; SECONDARY ION MASS SPECTROMETRY; STRONTIUM COMPOUNDS; SURFACE REACTIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

FERROELECTRIC RANDOM ACCESS MEMORIES (FRAM);

FERROELECTRIC THIN FILMS;

EID: 0036722918     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00552-X     Document Type: Article

References (10)