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Volumn 338-340, Issue 1 SPEC. ISS., 2004, Pages 378-381

Creation of metastable defects in microcrystalline silicon films by keV electron irradiation

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; AMORPHOUS SILICON; ANNEALING; CHEMICAL VAPOR DEPOSITION; CONCENTRATION (PROCESS); ELECTRIC CONDUCTIVITY; ELECTRON CYCLOTRON RESONANCE; ELECTRON IRRADIATION; LIGHT ABSORPTION; PHOTOCONDUCTIVITY; QUARTZ; SUBSTRATES; THERMAL EFFECTS; THIN FILMS;

EID: 2942562352     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2004.03.001     Document Type: Conference Paper
Times cited : (9)

References (15)
  • 14
    • 25944440144 scopus 로고    scopus 로고
    • Dissertation Universität Marburg, Cuvillier Verlag, Göttingen
    • C. Böhme, Dissertation Universität Marburg, 2002 (Cuvillier Verlag, Göttingen 2003).
    • (2002)
    • Böhme, C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.