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Volumn 338-340, Issue 1 SPEC. ISS., 2004, Pages 378-381
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Creation of metastable defects in microcrystalline silicon films by keV electron irradiation
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Author keywords
[No Author keywords available]
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Indexed keywords
ABSORPTION;
AMORPHOUS SILICON;
ANNEALING;
CHEMICAL VAPOR DEPOSITION;
CONCENTRATION (PROCESS);
ELECTRIC CONDUCTIVITY;
ELECTRON CYCLOTRON RESONANCE;
ELECTRON IRRADIATION;
LIGHT ABSORPTION;
PHOTOCONDUCTIVITY;
QUARTZ;
SUBSTRATES;
THERMAL EFFECTS;
THIN FILMS;
DANGLING BONDS;
EXCITATION GASES;
METASTABLE DEFECTS;
MONOCHROMATIC ILLUMINATIONS;
CRYSTALLINE MATERIALS;
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EID: 2942562352
PISSN: 00223093
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2004.03.001 Document Type: Conference Paper |
Times cited : (9)
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References (15)
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