TiN thin films deposited by ion beam sputtering: Effects of energetic particles bombardment

Thin Solid Films

Volumn 459, Issue 1-2, 2004, Pages 286-291

  Popovic N ^a   Bogdanov, Z ^a   Goncic B ^a   Zec, S ^a   Rakocevic Z ^a   Zlatanovic M ^b   Perusko D ^a  

^a UNIVERSITY OF BELGRADE   (Serbia)

^b Faculty of Electrical Engineering   (Serbia)

Author keywords

Nanosructures; Sputtering; TiN; X Ray diffraction

Indexed keywords

ION BEAMS; ION BOMBARDMENT; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; NITROGEN; SPUTTER DEPOSITION; SURFACE STRUCTURE; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS;

DUAL ION BEAM SPUTTERING; FILM SURFACES;

THIN FILMS;

EID: 2942534391     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.12.130     Document Type: Conference Paper

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