Low-energy broad-beam sputter deposition of TiNx thin films

Materials Science Forum

Volumn 413, Issue , 2002, Pages 159-164

  Goncic B ^a   Popovic N ^a   Bogdanov, Z ^a   Zec, S ^a   Zlatanovic M ^b  

^a UNIVERSITY OF BELGRADE   (Serbia)

^b Bulevar Revolucije 73   (Serbia)

Author keywords

Ion beam reactive sputtering; Preferred orientation; Resistivity TiN thin films

Indexed keywords

COLOR; ELECTRIC CONDUCTIVITY; GLASS; GRAIN SIZE AND SHAPE; ION BOMBARDMENT; PARTIAL PRESSURE; SPUTTER DEPOSITION; TEMPERATURE; TITANIUM NITRIDE;

LIGHT SENSITIVE DEVICE; LOW ENERGY ION BEAM REACTIVE SPUTTER DEPOSITION; RESIDUAL GAS PRESSURE;

THIN FILMS;

EID: 0036939590     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: None     Document Type: Conference Paper

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