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Volumn 81, Issue 1, 1996, Pages 29-35
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Energetic particles in PVD technology: Particle-surface interaction processes and energy-particle relationships in thin film deposition
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Author keywords
Film growth; Film nucleation; Ion bombardment; Physical vapor deposition
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
COMPUTER SIMULATION;
CRYSTAL ORIENTATION;
FILM GROWTH;
FILM PREPARATION;
ION BOMBARDMENT;
MAGNETRON SPUTTERING;
MOLECULAR DYNAMICS;
MONTE CARLO METHODS;
NUCLEATION;
PHASE COMPOSITION;
CATHODIC ARC DEPOSITION;
ENERGY PARTICLE RELATIONSHIPS;
FILM NUCLEATION;
ION PLATING;
PARTICLE SURFACE INTERACTION;
PHYSICAL VAPOR DEPOSITION;
THIN FILMS;
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EID: 0030148825
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/0257-8972(95)02617-7 Document Type: Article |
Times cited : (36)
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References (19)
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