Improvement of the crystallinity of ZnO thin films and frequency characteristics of a film bulk acoustic wave resonator by using an Ru buffer layer and annealing treatment

Superlattices and Microstructures

Volumn 39, Issue 1-4, 2006, Pages 138-144

  Kim, Eung Kwon ^a   Lee, Tae Yong ^a   Hwang, Hyun Suk ^a   Kim, Young Sung ^a   Park, Young ^b   Song, Joon Tae ^a  

^a Sungkyunkwan University   (South Korea)

^b Korea Railroad Research Institute   (South Korea)

Author keywords

FBARs; Membrane type; Pulse dc sputtering; Ru buffer layer; ZnO

Indexed keywords

ACOUSTIC WAVES; CRYSTALLINE MATERIALS; FILM GROWTH; RESONATORS; X RAY DIFFRACTION; ZINC OXIDE;

FBAR; MEMBRANE TYPE; PULSE DC SPUTTERING; RU BUFFER LAYER;

THIN FILMS;

EID: 29344448026     PISSN: 07496036     EISSN: 10963677     Source Type: Journal    
DOI: 10.1016/j.spmi.2005.08.066     Document Type: Article

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