Focused ion beam characterization of plasma-assisted deposition on polymer films at the nanoscale

Scanning

Volumn 27, Issue 6, 2005, Pages 275-283

  Milani, Marziale ^a   Riccardi, C ^a   Drobne, D ^b   Ciardi, A ^a   Esena, P ^a   Tatti, F ^c   Zanini, S ^a  

^a UNIVERSITY OF MILANO BICOCCA   (Italy)

^b UNIVERSITY OF LJUBLJANA   (Slovenia)

^c Thermo Fisher Scientific   (United States)

Author keywords

Focused ion beam; Nanomachining; Plasma assisted deposition; Polyethylene terephthalate; Ultramicroscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHARACTERIZATION; EDGE DETECTION; ION BEAMS; POLYETHYLENE TEREPHTHALATES; POLYMERS;

FOCUSED ION BEAM; NANOMACHINING; PLASMA-ASSISTED DEPOSITION; POLYMER FILMS; ULTRAMICROSCOPY;

THIN FILMS;

GALLIUM; POLYETHYLENE TEREPHTHALATE; POLYMER;

ARTICLE; ATOMIC FORCE MICROSCOPY; EDGE DETECTION METHOD; EVALUATION; FILM; FOCUSED ION BEAM; IMAGING SYSTEM; MATERIALS; NANOTECHNOLOGY; PLASMA; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPE; SCANNING ELECTRON MICROSCOPY; THICKNESS;

CHARACTERISTICS; POLYETHYLENE TEREPHTHALATE; POLYMERS; THIN FILMS;

EID: 29144498252     PISSN: 01610457     EISSN: None     Source Type: Journal    
DOI: 10.1002/sca.4950270602     Document Type: Article

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