PYRAMID - A hierarchical, rule-based approach toward proximity effect correction - Part II: Correction

IEEE Transactions on Semiconductor Manufacturing

Volumn 11, Issue 1, 1998, Pages 117-128

  Cook, Brian D ^b   Lee, Soo Young ^a,c  

^a IEEE   (United States)

^b CHARLES STARK DRAPER LABORATORY   (United States)

^c AUBURN UNIVERSITY   (United States)

Author keywords

Computational model; Correction; Electron beam lithography; Exposure estimation; Global correction; Local correction; Proximity effect

Indexed keywords

COMPUTER SIMULATION; ELECTRON SCATTERING; ESTIMATION; INTEGRATED CIRCUIT LAYOUT; MATHEMATICAL MODELS; SUBSTRATES;

EXPOSURE ESTIMATION; PROXIMITY EFFECT CORRECTION SCHEME;

ELECTRON BEAM LITHOGRAPHY;

EID: 0032001750     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.661291     Document Type: Article

References (13)

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