Al-induced crystallization during low-temperature deposition of Si films by inductively coupled plasma CVD

Journal of the Korean Physical Society

Volumn 46, Issue SUPPL., 2005, Pages

  He, Deyan ^a   Wang, Xiaoqiang ^a   Chen, Qiang ^a   Li, Junshuai ^a  

^a LANZHOU UNIVERSITY   (China)

Author keywords

Al induced crystallization growth; Inductively coupled plasma CVD; Low temperature poly Si films

Indexed keywords

EID: 20444494417     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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