Stable and metastable iron silicide phases on Si(1 0 0)

Surface Science

Volumn 599, Issue 1-3, 2005, Pages 122-127

  Dezsi I ^a   Fetzer, Cs ^a   Szucs, I ^a   Dekoster, J ^b   Vantomme, A ^b   Caymax, M ^c  

^a WIGNER RESEARCH CENTRE FOR PHYSICS   (Hungary)

^b KU LEUVEN   (Belgium)

^c CMOS Device Research Group   (Belgium)

Author keywords

Atomic solid interactions; M ssbauer spectroscopy; Polycrystalline thin films; Silicides

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; MAGNETIC MATERIALS; METALLIC FILMS; MOSSBAUER SPECTROSCOPY; POLYCRYSTALLINE MATERIALS; SILICON; THIN FILMS;

ATOMIC-SOLID INTERACTIONS; FILM THICKNESS; POLYCRYSTALLINE THIN FILMS; SILICIDES;

IRON COMPOUNDS;

EID: 28644447551     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2005.09.040     Document Type: Article

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