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Materials Science and Engineering: A

Volumn 409, Issue 1-2, 2005, Pages 317-328

Influence of titanium oxide films on copper nucleation during electrodeposition

(3) Chang, Hyun K a Choe, Byung Hak b Lee, Jong K c

a Sungkyunkwan University (South Korea)

b Gangneung Wonju National University (South Korea)

c Michigan Technological University (United States)

Author keywords

Anodization; Copper nucleation; Dislocation; Electrodeposition; Pipe tunnelling; Titanium cathode; Titanium oxide

Indexed keywords

CATHODES; CHARGE TRANSFER; COPPER; DISLOCATIONS (CRYSTALS); ELECTRODEPOSITION; ELECTROLYTES; ELECTRON TUNNELING; METALLIC FILMS; NUCLEATION; REACTION KINETICS;

ANODIZATION; COPPER NUCLEATION; PIPE TUNNELING; TITANIUM CATHODE; TITANIUM OXIDE FILMS;

TITANIUM OXIDES;

COPPER; ELECTRODEPOSITION; NUCLEATION; PIPE; TITANIUM OXIDE; TUNNELING;

EID: 28644441161 PISSN: 09215093 EISSN: None Source Type: Journal
DOI: 10.1016/j.msea.2005.03.114 Document Type: Article

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