Detecting focus-sensitive configurations during OPC

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5756, Issue , 2005, Pages 255-261

  Melvin III, Lawrence S ^a   Shiely, James P ^a   Yan, Qiliang ^a  

^a SYNOPSYS INC   (United States)

Author keywords

OPC; Process variation; Process window; Process window optimization

Indexed keywords

OPC; PROCESS VARIATION; PROCESS WINDOW; PROCESS WINDOW OPTIMIZATION;

COMPUTER SIMULATION; HEURISTIC METHODS; OPTICAL SYSTEMS; OPTIMIZATION; PHOTOLITHOGRAPHY;

OPTICAL CORRELATION;

EID: 25144444781     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.601062     Document Type: Conference Paper

References (3)

1. "International Technology Road Map for Semiconductors, 2004 Update, Design," http://www.itrs.net/.
2. th (Expanded) Edition, Cambridge University Press, UK, 1999, pp 484-6.
3. Melvin, Lawrence S., III, J. Shiely, M. Rieger, B. Painter, "A Methodology to Calculate Line-End Correction Feature Performance as a Function of Reticle Cost," Paper No 5040-40, Optical Microlithography XVI, Proceedings of SPIE, A. Yen ed., Santa Clara, CA, USA, February 25-8, 2003, pp 441-9