Improvement of develop loading effect in FEP-171 process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5446, Issue PART 1, 2004, Pages 118-127

  Ha, Tae Joong ^a   Lee, Young Mo ^a   Choi, Bo K ^a   Choi, Yong Kyoo ^a   Han, Oscar ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

Develop loading effect; Dissolution rate; Double puddle development; FEP 171; Photomask

Indexed keywords

DISSOLUTION; NOZZLES; OPTIMIZATION; PATTERN RECOGNITION; PROBLEM SOLVING; SCANNING ELECTRON MICROSCOPY;

DEVELOP LOADING EFFECTS; DISSOLUTION RATES; PHOTOMASKS; PUDDLE DEVELOPMENT;

MASKS;

EID: 11844296778     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.557709     Document Type: Conference Paper

References (3)

1. Jae-Chun Shin et al., "Develop Process Optimization for CD Uniformity Improvement", In 20th Annual BACUS Symposium on Photomask Technology, Proceedings of SPIE Vol. 4186, pp. 540-548, 2000
2. Hideaki Sakurai et al., "Performance of Proximity Gap Suction Development (PGSD)", In 22nd Annual BACUS Symposium on Photomask Technology, Proceedings of SPIE Vol. 4889, pp. 737-745, 2002
3. Kotaro Ooishi et al., "New Development Method Eliminating the Loading and Micro-Loading Effect", In Photomask and Next-Generation Lithography Mask Technology X, Proceedings of SPIE Vol. 5130, pp. 67-77, 2003