Anisotropic etching of dielectrics exposed by high intensity femtosecond pulses

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5850, Issue , 2005, Pages 59-66

  Juodkazis, Saulius ^a   Tabuchi, Yuusuke ^b   Ebisui, Takahiro ^b   Matsuo, Shigeki ^b   Misawa, Hiroaki ^a  

^a HOKKAIDO UNIVERSITY   (Japan)

^b UNIVERSITY OF TOKUSHIMA   (Japan)

Author keywords

Anisotropic wet etching; Femtosecond laser microfabrication; Microfluidics; Ripple formation

Indexed keywords

ANISOTROPY; CRYSTALLINE MATERIALS; ETCHING; FLUID DYNAMICS; LASER BEAM EFFECTS; LASER PULSES; MICROELECTRONICS;

ANISOTROPIC WET ETCHING; FEMTOSECOND LASER MICROFABRICATION; MICROFLUIDICS; RIPPLE FORMATION;

DIELECTRIC MATERIALS;

EID: 28444475894     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.633670     Document Type: Conference Paper

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