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Volumn , Issue , 2005, Pages 8-13

Modeling and analysis of total leakage currents in nanoscale double gate devices and circuits

Author keywords

Double Gate devices; Gate leakage; Quantum effect; SRAM; Stacking effect; Subthreshold leakage

Indexed keywords

COMPUTER SIMULATION; DOPING (ADDITIVES); ELECTRON TUNNELING; GATES (TRANSISTOR); QUANTUM THEORY; STATIC RANDOM ACCESS STORAGE;

EID: 28444470231     PISSN: 15334678     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1145/1077603.1077608     Document Type: Conference Paper
Times cited : (7)

References (15)
  • 1
    • 1842865629 scopus 로고    scopus 로고
    • Turning silicon on its edge
    • Jan/Feb
    • E. Nowak, et. al, "Turning silicon on its edge", IEEE Circuits & Device Magazine, Jan/Feb 2004, pp. 20-31.
    • (2004) IEEE Circuits & Device Magazine , pp. 20-31
    • Nowak, E.1
  • 4
    • 0035694506 scopus 로고    scopus 로고
    • Analytic solutions of charge and capacitance in symmetric and asymmetric double-gate MOSFETs
    • Dec.
    • Y. Taur, "Analytic solutions of charge and capacitance in symmetric and asymmetric double-gate MOSFETs", IEEE TED, vol. 48, Dec. 2001, pp. 2861-2869
    • (2001) IEEE TED , vol.48 , pp. 2861-2869
    • Taur, Y.1
  • 5
    • 28444442195 scopus 로고    scopus 로고
    • A compact double-gate MOSFET model comprising quantum-mechanical and nonstatic effects
    • Aug.
    • G. Baccarani, "A Compact Double-Gate MOSFET Model Comprising Quantum-Mechanical and Nonstatic Effects," IEEE TED, vol. 49, Aug. 1999, pp-1656-1666.
    • (1999) IEEE TED , vol.49 , pp. 1656-1666
    • Baccarani, G.1
  • 6
    • 7044235906 scopus 로고    scopus 로고
    • Nanoscale metal-oxide-semiconductor field-effect transistor: Scaling limits and opportunities
    • Oct.
    • Q. Chen, Nanoscale metal-oxide-semiconductor field-effect transistor: scaling limits and opportunities," Nanotechology, vol. 15, Oct. 2004, pp-S545-S555.
    • (2004) Nanotechology , vol.15
    • Chen, Q.1
  • 7
    • 2442568748 scopus 로고    scopus 로고
    • Process/physics-based threshold voltage model for nano-scaled double-gate devices
    • Mar.
    • K. Kim, et. al., "Process/physics-based threshold voltage model for nano-scaled double-gate devices", International Journal of Electronics, vol. 91, Mar. 2004, pp. 139-148.
    • (2004) International Journal of Electronics , vol.91 , pp. 139-148
    • Kim, K.1
  • 8
    • 0036999726 scopus 로고    scopus 로고
    • Direct tunneling gate leakage current in double-gate and ultrathin body MOSFETs
    • Dec.
    • L. Chang, et. al., "Direct tunneling gate leakage current in double-gate and ultrathin body MOSFETs", IEEE TED, vol. 49, Dec. 2002, pp. 2288-2295.
    • (2002) IEEE TED , vol.49 , pp. 2288-2295
    • Chang, L.1
  • 9
    • 0033579745 scopus 로고    scopus 로고
    • Analytic model for direct tunneling current in polycrystalline silicon-gate meta-oxide-semiconductor devices
    • Jan.
    • L. F. Register, et. al., "Analytic model for direct tunneling current in polycrystalline silicon-gate meta-oxide-semiconductor devices", Applied Physics Letter, vol. 74, Jan. 1999, pp. 457-459.
    • (1999) Applied Physics Letter , vol.74 , pp. 457-459
    • Register, L.F.1
  • 10
    • 0035367617 scopus 로고    scopus 로고
    • Characterization and modeling of edge direct tunneling (EDT) leakage in ultrathin gate oxide MOSFETs
    • June
    • K. Yang, et.al, "Characterization and modeling of edge direct tunneling (EDT) leakage in ultrathin gate oxide MOSFETs,", IEEE TED, vol. 48, June. 2001, pp-1159-64.
    • (2001) IEEE TED , vol.48 , pp. 1159-1164
    • Yang, K.1
  • 12
    • 84861288969 scopus 로고    scopus 로고
    • Online
    • SCHRED [Online]. Available: http://nanohub.purdue.edu/.
  • 13
    • 0034293823 scopus 로고    scopus 로고
    • Modeling of direct tunneling current through gate dielectric stacks
    • Oct.
    • S. Mudanai, et.al, "Modeling of direct tunneling current through gate dielectric stacks," IEEE TED, vol. 47, Oct. 2000, pp-1851-57
    • (2000) IEEE TED , vol.47 , pp. 1851-1857
    • Mudanai, S.1
  • 14
    • 0034867611 scopus 로고    scopus 로고
    • Scaling of stack effect and its application for leakage reduction
    • S. Narendra, et.al. "Scaling of stack effect and its application for leakage reduction," ISLPED, 2001, pp. 195-200.
    • (2001) ISLPED , pp. 195-200
    • Narendra, S.1
  • 15
    • 0141538246 scopus 로고    scopus 로고
    • Accurate modeling of transistor stacks to effectively reduce total standby leakage in nano-scale CMOS circuits
    • S. Mukhopadhyay, et.al, "Accurate modeling of transistor stacks to effectively reduce total standby leakage in nano-scale CMOS circuits", Symp. of VLSI Circuits, 2003, pp. 53-56.
    • (2003) Symp. of VLSI Circuits , pp. 53-56
    • Mukhopadhyay, S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.