Aluminum mobility and interfacial segregation in fully silicided gate contacts

Applied Physics Letters

Volumn 87, Issue 16, 2005, Pages 1-3

  Pezzi, R P ^a   Copel, M ^b   Cabral Jr , C ^b   Baumvol, I J R ^c  

^a FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

^b IBM T J WATSON RESEARCH CENTER   (United States)

^c UNIVERSITY OF CAXIAS DO SUL   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

METAL GATES; METAL SILICIDATION; RESONANT NUCLEAR REACTION;

RAPID THERMAL ANNEALING; REACTION KINETICS; SILICA;

ALUMINUM;

EID: 28344432128     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2103392     Document Type: Article

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