a-SiGe:H materials and devices deposited by hot wire CVD using a tantalum filament operated at low temperature

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2005, Pages 1397-1400

  Mahan, A H ^a   Xu, Y ^a   Gedvilas, L M ^a   Reedy, R C ^a   Williamson, D L ^b   Datta, S ^c   Cohen, J D ^c   Yan, B ^d   Branz, H M ^a  

^a NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

^b Department of Metallurgical and Materials Engineering   (United States)

^c UNIVERSITY OF OREGON   (United States)

^d United Solar Ovonics Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HOT WIRE CVD (HWCVD); MATERIAL QUALITY;

CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY; FILAMENTS (LAMP); LOW TEMPERATURE EFFECTS; TANTALUM; THIN FILMS; X RAY SCATTERING;

SILICON COMPOUNDS;

EID: 27944473314     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (21)

1. S. Guha, J. Yang, A. Pawlikiew, T. Glatfeilter, R. Ross, and S.R. Ovshinsky, Appl. Phys. Lett. 54 (1989) 2330.
2. J. Fölsch, H. Stiebig, F. Finger, B. Rech, D. Lundszien, A. Lambertz, and H. Wagner, Proc. 25th PVSC IEEE Conference, Washington, D.C. (1996) 1133.
3. A.H. Mahan, J. Carapella, B.P. Nelson, R.S. Crandall, and I. Balberg, J. Appl. Phys. 69 (1991) 6728.
4. A.H. Mahan, R.C. Reedy, E. Iwaniczko, Q. Wang, B.P. Nelson, Y. Xu, A.C. Gallagher, H.M. Branz, R.S. Crandall, J. Yang, and S. Guha, MRS Symp. Proc. 507 (1998) 119.
5. Y. Xu, B.P. Nelson, D.L. Williamson, L.M. Gedvilas, and R.C. Reedy, MRS Symp. Proc. 762 (2003) 455.
6. A.H. Mahan, Y. Xu, and L.M. Gedvilas, MRS Symp. Proc. 808 (2004) 407.
7. Y. Xu, B.P. Nelson, L.M. Gedvilas, and R.C. Reedy, Thin Solid Films 430 (2003) 197-201.
8. M.K. van Veen, Ph.D. Thesis (Utrecht University, 2003).
9. Q. Wang, private communication.
10. Y. Hishikawa, N. Nakamura, S. Tsuda, S. Nakano, Y. Kishi, and Y. Kuwano, Jpn. J. Appl. Phys. 30 (1991) 1008.
11. rd Intl. Conf. on Hot-Wire CVD (Cat-CVD) Process, Utrecht, The Netherlands, 2004, to be published in Thin Solid Films.
12. A.H. Mahan, P. Raboisson, D.L. Williamson, and R. Tsu, Solar Cells 21 (1987) 117.
13. A. Terakawa, Ph.D. Thesis, Kyoto University (1999).
14. J. Folsch, F. Finger, T. Kulessa, F. Siebke, W. Beyer, and H. Wagner, MRS Symp. Proc. 377 (1995) 517.
15. Y-P. Chou and S-C. Lee, J. Appl. Phys. 83 (1998) 4111.
16. D.L. Williamson, NREL Report SR-520-31908 (2002) 37.
17. Y-M. Li, Ph.D. Thesis, Harvard University (1990).
18. R.J. Soukup, N.J. Ianno, S.A. Darveau, and C.L. Exstrom. MRS Symp. Proc. 808 (2004) 359.
19. J.D. Cohen, EMIS Data Review Series 19 (1998) 180.
20. Y. Xu, B. Yan, B.P. Nelson, E. Iwaniczko, R.C. Reedy, A.H. Mahan, and H.M. Branz, MRS Symp. Proc. 808 (2004) 617.
21. B. Yan, private communiction.