Electron energy distribution function in low-pressure complex plasmas

Journal of Plasma Physics

Volumn 71, Issue 2, 2005, Pages 217-224

  Ostrikov, K ^a,c   Denysenko, I ^b,d   Yu, M Y ^b   Xu, S ^c  

^a UNIVERSITY OF SYDNEY   (Australia)

^b RUHR UNIVERSITY BOCHUM   (Germany)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^d V N KARAZIN KHARKIV NATIONAL UNIVERSITY   (Ukraine)

Author keywords

[No Author keywords available]

Indexed keywords

DUST; ELECTRON ENERGY LEVELS; FUNCTIONS; LARGE SCALE SYSTEMS;

DUST DENSITY; ELECTRON ENERGY DISTRIBUTION FUNCTION (EEDF); ELECTRON TEMPERATURE;

PLASMAS;

EID: 27844602418     PISSN: 00223778     EISSN: 14697807     Source Type: Journal    
DOI: 10.1017/S002237780400354X     Document Type: Article

References (24)

1. Thomas, H. M. and Morfill, G. E. 1996 Nature 379, 806.
2. Bouchoule, A. (ed.). 1999 Dusty Plasmas: Physics, Chemistry and Technological Impacts in Plasma Processing. New York: Wiley.
3. Hollenstein, Ch. 2000 Plasma Phys. Control. Fusion 42, R93.
4. Vladimirov, S. V. and Ostrikov, K. 2004 Phys. Rep. 393, 175.
5. Denysenko, I., Yu, M. Y., Ostrikov, K., Azarenkov, N. A. and Stenflo, L. 2004 Phys. Plasmas 11, 4959.
6. Boufendi, L. and Bouchoule, A. 2002 Plasma Sources Sci. Technol. A 11, 211.
7. Li, Y. J. T. 1996 Etching. ULSI Technology (ed. C. Y. Chang and S. M. Sze). New York: McGraw-Hill, pp. 329-370.
8. Oehrlein, G. S. 2003 Plasma Processing of Electronic Materials. Berlin: Springer.
9. Lieberman, M. A. and Lichtenberg, A. J. 1994 Principles of Plasma Discharges and Materials Processing. New York: Wiley.
10. Godyak, V. A., Piejak, R. B. and Alexandrovich, B. M. 1992 Phys. Rev. Lett. 68, 40.
11. Godyak, V. A., Piejak, R. B. and Alexandrovich, B. M. 1995 Plasma Sources Sci. Technol. 4, 332.
12. Smolyakov, A. I., Godyak, V. and Tyshetskiy, Y. 2001 Phys. Plasmas 8, 3857.
13. Sugai, H., Ghanashev, I., Hosokawa, M., Misuno, K., Nakamura, K., Toyoda, H. and Yamauchi, K. 2001 Plasma Sources Sci. Technol. 10, 378.
14. Xu, S., Ostrikov, K. N., Li, Y., Tsakadze, E. and Jones, I. R. 2001 Phys. Plasmas 8, 2549.
15. Kolobov, V. I. and Godyak, V. A. 1995 IEEE Trans. Plasma Sci. 23, 503.
16. Kortshagen, U., Busch, C. and Tsendin, L. D. 1996 Plasma Sources Sci. Technol. 5, 1.
17. Fridman, A. A., Boufendi, L., Hbid, T., Potapkin, B. N. and Bouchoule, A. 1996 J. Appl. Phys. 79, 1303.
18. Wang, D. and Dong, J. Q. 1997 J. Appl. Phys. 81, 38.
19. Denysenko, I., Yu, M. Y., Ostrikov, K. and Smolyakov, A. 2004 Phys. Rev. E 70, 046403.
20. Bouchoule, A. and Boufendi, L. 1993 Plasma Sources Sci. Technol. 2, 204.
21. Shkarofsky, I. P., Johnston, T. W. and Bachynski, M. P. 1966 The Particle Kinetics of Plasma. Reading, MA: Addison-Wesley.
22. Biberman, L. M., Vorobev, V. S. and Yakubov, I. T. 1982 Kinetics of Nonequilibrium Low-Temperature Plasma. Nauka: Moscow.
23. Gudmundsson, J. T. 2001 Plasma Sources Sci. Technol. 10, 76.
24. McCaughey, M. J. and Kushner, M. J. 1991 J. Appl. Phys. 69, 6952.