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Volumn , Issue , 2004, Pages 99-108
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Advanced doping and millisecond annealing for ultra-shallow junctions for 65nm and beyond
a b a b |
Author keywords
[No Author keywords available]
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Indexed keywords
FLASHLIGHTS;
ION IMPLANTATION;
OPTIMIZATION;
SILICON WAFERS;
DRAIN EXTENSIONS;
NODES;
ULTRA-SHALLOW JUNCTIONS;
RAPID THERMAL ANNEALING;
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EID: 27844512692
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (13)
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References (8)
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