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1
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27744562245
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"0.1 μm InGaAs/InAlAs/InP HEMT production process for MMW applications from 2-200 GHz"
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presented at the Int. Conf. Gallium-Arsenide Manufacturing Technology, May
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R. Lai, M. Barsky, R. Grundbacher, L. Tran, T. Block, T. P. Chin, V. Medvedev, E. Sabin, H. Rogers, P. H. Liu, Y. C. Chen, R. Tsai, and D. Streit, "0.1 μm InGaAs/InAlAs/InP HEMT production process for MMW applications from 2-200 GHz," presented at the Int. Conf. Gallium-Arsenide Manufacturing Technology, May 1999.
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(1999)
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Lai, R.1
Barsky, M.2
Grundbacher, R.3
Tran, L.4
Block, T.5
Chin, T.P.6
Medvedev, V.7
Sabin, E.8
Rogers, H.9
Liu, P.H.10
Chen, Y.C.11
Tsai, R.12
Streit, D.13
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2
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0026152278
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"A super low-noise 0.1 μm T-gate InAlAs-InGaAs-InP HEMT"
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May
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K. H. G. Duh, P. C. Chao, S. M. J. Liu, P. Ho, M. Y. Kao, and J. M. Ballingall, "A super low-noise 0.1 μm T-gate InAlAs-InGaAs-InP HEMT," IEEE Microw. Guided Wave Lett., vol. 1, no. 5, pp. 114-116, May 1991.
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(1991)
IEEE Microw. Guided Wave Lett.
, vol.1
, Issue.5
, pp. 114-116
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Duh, K.H.G.1
Chao, P.C.2
Liu, S.M.J.3
Ho, P.4
Kao, M.Y.5
Ballingall, J.M.6
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3
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0035506980
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"Ultrahigh-Speed pseudomorphic InGaAs/InAlAs HEMT with 400 GHz cutoff frequency"
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Jun.
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K. Shinohara, Y. Yamashita, A. Endoh, T. Mimra, T. Matsui, and S. Hiyamizu, "Ultrahigh-Speed pseudomorphic InGaAs/InAlAs HEMT with 400 GHz cutoff frequency," IEEE Electron Device Lett., vol. 22, no. 6, p. 507, Jun. 2001.
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(2001)
IEEE Electron Device Lett.
, vol.22
, Issue.6
, pp. 507
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Shinohara, K.1
Yamashita, Y.2
Endoh, A.3
Mimra, T.4
Matsui, T.5
Hiyamizu, S.6
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4
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3042585773
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"Low-noise metamorphic HEMTs with reflowed 0.1 μm T-gate"
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Jun.
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Y. C. Chang, E. Y. Chang, H. C. Chu, L. H. Huang, G. W. Lee, H. M. Lee, C. S. Chen, S. H. Shen, P. T. Chang, and C. Y. Lien, "Low-noise metamorphic HEMTs with reflowed 0.1 μm T-gate," IEEE Electron Device Lett., vol. 25, no. 6, pp. 348-350, Jun. 2004.
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(2004)
IEEE Electron Device Lett.
, vol.25
, Issue.6
, pp. 348-350
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Chang, Y.C.1
Chang, E.Y.2
Chu, H.C.3
Huang, L.H.4
Lee, G.W.5
Lee, H.M.6
Chen, C.S.7
Shen, S.H.8
Chang, P.T.9
Lien, C.Y.10
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5
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0038149436
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"70-nm low-noise metamorphie HEMT technology on 4 inch GaAs wafers"
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May
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A. Leuther, A. Tessmann, M. Dammann, W. Reinert, M. Schlechtweg, M. Mikulla, M. Walther, and G. Weimann, "70-nm low-noise metamorphie HEMT technology on 4 inch GaAs wafers," in Proc. Int. Conf. Indium Phosphide and Related Materials, May 2003, pp. 215-218.
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(2003)
Proc. Int. Conf. Indium Phosphide and Related Materials
, pp. 215-218
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Leuther, A.1
Tessmann, A.2
Dammann, M.3
Reinert, W.4
Schlechtweg, M.5
Mikulla, M.6
Walther, M.7
Weimann, G.8
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6
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0033874969
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0.57As metamorphic HEMT on GaAs substrate with 850 mW/mm output power density"
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Jan.
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0.57As metamorphic HEMT on GaAs substrate with 850 mW/mm output power density," IEEE Electron Device Lett., vol. 21, no. 1, pp. 5-8, Jan. 2000.
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(2000)
IEEE Electron Device Lett.
, vol.21
, Issue.1
, pp. 5-8
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Whelan, C.S.1
Hoke, W.F.2
McTaggart, R.A.3
Lardizabal, M.4
Lyman, P.S.5
Marsh, P.F.6
Kazior, T.E.7
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7
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0037810897
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"0.15 μm gate length InAlAs/InGaAs power metamorphic HEMT on GaAs substrate with extremely low noise characteristics"
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presented at the Int. Conf. Indium Phosphide and Related Materials, May
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H. S. Yoon, J. H. Lee, J. Y. Shim, J. Y. Hong, D. M. Kang, W. J. Chang, H. C. Kim, and K. I. Cho, "0.15 μm gate length InAlAs/InGaAs power metamorphic HEMT on GaAs substrate with extremely low noise characteristics," presented at the Int. Conf. Indium Phosphide and Related Materials, May 2003, pp. 114-117.
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(2003)
, pp. 114-117
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Yoon, H.S.1
Lee, J.H.2
Shim, J.Y.3
Hong, J.Y.4
Kang, D.M.5
Chang, W.J.6
Kim, H.C.7
Cho, K.I.8
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8
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27744530814
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T of 430 GHz using a nonannealed ohmic contact process"
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Amsterdam, The Netherlands, Oct. 11-12
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T of 430 GHz using a nonannealed ohmic contact process," in Proc. 12th Gallium Arsenide and Other Compound Semiconductors Application Symp., Amsterdam, The Netherlands, Oct. 11-12, 2004, pp. 311-314.
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(2004)
Proc. 12th Gallium Arsenide and Other Compound Semiconductors Application Symp.
, pp. 311-314
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Moran, D.A.J.1
Boyd, E.2
Elgaid, K.3
McLelland, H.4
Stanley, C.R.5
Thayne, I.G.6
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9
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27744524540
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"The fabrication of ultra short T-gates using a PMMAILOR/UVIII resist stack"
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presented at the 47th Int. Conf. Electron, Ion, and Photon Beam Technology and Nanofabrication, Tampa, FL, May
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Y. Chen, D. Macintyre, X. Cao, E. Boyd, D. Moran, H. McLelland, C. Stanley, I. Thayne, and S. Thoms, "The fabrication of ultra short T-gates using a PMMAILOR/UVIII resist stack," presented at the 47th Int. Conf. Electron, Ion, and Photon Beam Technology and Nanofabrication, Tampa, FL, May 2003.
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(2003)
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Chen, Y.1
Macintyre, D.2
Cao, X.3
Boyd, E.4
Moran, D.5
McLelland, H.6
Stanley, C.7
Thayne, I.8
Thoms, S.9
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10
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33747444607
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"Metamorphic 50 nm InAs-Channel HEMT"
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May
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A. Leuther, R. Weber, M. Dammann, M. Schlechtweg, M. Mikulla, M. Walther, and G. Weimann, "Metamorphic 50 nm InAs-Channel HEMT," in Proc. Int. Conf. Indium Phosphide and Related Materials, May 2005, pp. 129-132.
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(2005)
Proc. Int. Conf. Indium Phosphide and Related Materials
, pp. 129-132
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-
Leuther, A.1
Weber, R.2
Dammann, M.3
Schlechtweg, M.4
Mikulla, M.5
Walther, M.6
Weimann, G.7
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11
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0036803456
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"Pseudomorphic In0:52Al0:48As/In0:7Ga0:3As HEMTs with an ultrahigh fT of 562 GHz"
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Oct.
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Y. Yamashita, A. Endoh, K. Shinohara, K. Hikosaka, T. Matsui, S. Hiyamizu, and T. Mimura, "Pseudomorphic In0:52Al0:48As/In0:7Ga0:3As HEMTs with an ultrahigh fT of 562 GHz," IEEE Electron Device Lett., vol. 23, no. 10, pp. 573-575, Oct. 2002.
-
(2002)
IEEE Electron Device Lett.
, vol.23
, Issue.10
, pp. 573-575
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Yamashita, Y.1
Endoh, A.2
Shinohara, K.3
Hikosaka, K.4
Matsui, T.5
Hiyamizu, S.6
Mimura, T.7
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