Surface structure of commercial Si3N4 powders analyzed by X-Ray Photoelectron Spectroscopy (XPS)

Journal of the Ceramic Society of Japan

Volumn 113, Issue 1322, 2005, Pages 647-653

  Hien, Tran Thi Thu ^a,c   Ishizaki, Chanel ^b   Ishizaki, Kozo ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

^b Nano TEM Co Ltd   (Japan)

^c HANOI UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Viet Nam)

Author keywords

Powder; Si tetrahedra; Silicon nitride; Surface structure; X ray photoelectron spectroscopy (XPS)

Indexed keywords

ETCHING; PRECIPITATION (CHEMICAL); REDUCTION; SILICON NITRIDE; SURFACE STRUCTURE; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBOTHERMAL REDUCTION; DIIMIDE PRECIPITATION; NITRIDATION; SI TETRAHEDRA;

POWDER METALS;

EID: 27744536216     PISSN: 09145400     EISSN: 13486535     Source Type: Journal    
DOI: 10.2109/jcersj.113.647     Document Type: Article

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