SiHx absorbance bands in Si3N4 powder surfaces analyzed by diffuse reflectance infrared fourier transform spectroscopy

Journal of the Ceramic Society of Japan

Volumn 112, Issue 1301, 2004, Pages 1-5

  Hien, Tran Thi Thu ^a,b   Ishizaki, Chanel ^a,c   Ishizaki, Kozo ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

^b HANOI UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Viet Nam)

^c Nano TEM Co Ltd   (Japan)

Author keywords

Diffuse reflectance infrared fourier transform (DRIFT) spectroscopy; SiHx bands; Silicon nitride powders; Surface

Indexed keywords

ABSORPTION; ABSORPTION SPECTROSCOPY; CHEMICAL BONDS; DIFFUSION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NITRIDING; POWDER METALS; PRECIPITATION (CHEMICAL); REDUCTION; REFLECTION; SURFACES; SYNTHESIS (CHEMICAL);

ABSORBANCE BANDS; CARBOTHERMAL REDUCTION; DIFFUSE REFLECTANCE INFRARED FOURIER TRANSFORM SPECTROSCOPY; DIIMIDE PRECIPITATION; NITRIDATION; OXYNITRIDE;

SILICON NITRIDE;

EID: 1442336163     PISSN: 09145400     EISSN: None     Source Type: Journal    
DOI: 10.2109/jcersj.112.1     Document Type: Article

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