Structural and optical properties of ZnO fabricated by reactive e-beam and rf magnetron sputtering techniques

Physica Status Solidi C: Conferences

Volumn 2, Issue 4, 2005, Pages 1331-1335

  Al Asmar, R ^a   Ferblantier, G ^a   Mailly, F ^a   Foucaran, A ^a  

^a UNIVERSITÉ MONTPELLIER II   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; ELECTRON ABSORPTION; ELLIPSOMETRY; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; PERMITTIVITY; X RAY DIFFRACTION ANALYSIS;

ANNEALING TREATMENT; FULL WIDTH AT HALF MAXIMUM (FWMH); REACTIVE E-BEAM EVAPORATION; RF MAGNETRON SPUTTERING TECHNIQUES;

ZINC OXIDE;

EID: 27344450543     PISSN: 16101634     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1002/pssc.200460447     Document Type: Conference Paper

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