Thermal oxidation of polycrystalline and single crystalline aluminum nitride wafers

Journal of Electronic Materials

Volumn 34, Issue 10, 2005, Pages 1271-1279

  Gu, Z ^a   Edgar, J H ^a   Speakman, S A ^b   Blom, D ^b   Perrin, J ^c   Chaudhuri, J ^c  

^a Kansas State University   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

^c Texas Tech University   (United States)

Author keywords

Aluminum nitride (AlN); Polycrystalline; Single crystalline; Thermal oxidation

Indexed keywords

ALUMINUM NITRIDE; DIFFUSION; MATHEMATICAL MODELS; OXIDATION; SINGLE CRYSTALS; TRANSMISSION ELECTRON MICROSCOPY;

ALN SINGLE CRYSTALS; LINEAR PARABOLIC MODEL; SINGLE CRYSTALLINE; THERMAL OXIDATION;

POLYCRYSTALLINE MATERIALS;

EID: 27144444069     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-005-0250-y     Document Type: Article

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