Effects of sequential annealing processes on surface morphology and resistivity of Indium-Tin Oxide (ITO) thin films fabricated by chemical solution deposition

Journal of Ceramic Processing Research

Volumn 6, Issue 3, 2005, Pages 259-262

  Yun, Young Hoon ^a   Hyun, Woong Han ^a   Mi, Jung Choi ^a   Sung, Churl Choi ^a  

^a Hanyang University   (South Korea)

Author keywords

Chemical solution deposition; Indium tin oxide (ITO) films; Resistivity; Sequential annealing process; Surface morphology

Indexed keywords

EID: 26844460625     PISSN: 12299162     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (14)

1. K.L. Chopra, S. Major, and D.K. Pandya, Thin Solid Films 102 (1983) 1-43.
2. B.H. Lee, I.G. Kim, S.W Cho, and S.H. Lee, Thin Solid Films 302 (1997) 25-30.
3. L.J. Meng, and M.P.D. Santos, Thin Solid Films 322 (1998) 56-62.
4. T. Maruyama, and K. Fukui, J. Appl. Phys. 70 (1991) 3848-3851.
5. J.K. Sheu, Y.K. Su, G.C. Chi, M.J. Jou, and C.M. Chang, Appl. Phys. Lett. 72 (1998) 3317-3319.
6. C. Cali, M. Mosca, and G. Targia, Solid State Electron 42 (1998) 877-879.
7. J. Zhang, K.H Au, Z.Q. Zhu, and S. O'Shea, Optical Materials 26 (2004) 47-55.
8. M. Toki, and M. Aizawa, J. Sol-Gel Sci. Technol. 8 (1997) 717-720.
9. K. Nishio, T. Sei, and T. Tsuchiya, J. Mat. Sci. 31 (1996) 1761-1766.
10. M.J. Alam, and D.C. Cameron, Thin Solid Films 420-421 (2002) 76-82.
11. Y. Djaoued, V.H. Phong, S. Badilscu, P.V. Ashrit, F.E. Girouard, and V.V. Truong: Thin Solid Films 293 (1997) 108-112.
12. S.S. Kim, S.Y. Choi, C.G. Park, and H.W Jin, Thin Solid Films 347 (1999) 155-160.
13. H.L. Ma, D.H. Zhang, P. Ma, S.Z. Win, and S.Y. Li, Thin Solid Films 263 (1995) 105-110.
14. S.R. Raamanan, This Solid Films 389 (2001) 207-212.