Dry etching, surface passivation and capping processes for antimonide based photodetectors

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5783, Issue PART I, 2005, Pages 98-105

  Dutta, Partha ^a   Langer, Jeffery ^a   Bhagwat, Vinay ^a   Juneja, Jasbir ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

Antimonide surfaces; Infrared photodetectors; Leakage currents; Surface capping; Surface passivation

Indexed keywords

ANTIMONIDE SURFACES; INFRARED PHOTODETECTORS; SURFACE CAPPING; SURFACE PASSIVATION;

AMMONIUM COMPOUNDS; DRY ETCHING; LEAKAGE CURRENTS; PASSIVATION; PLASMA THEORY; SEMICONDUCTING ANTIMONY COMPOUNDS; SILICON NITRIDE;

INFRARED DETECTORS;

EID: 26444549024     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.605330     Document Type: Conference Paper

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