Incomplete laser annealing of ion doping damage at source/drain junctions of poly-Si thin-film transistors

Electrochemical and Solid-State Letters

Volumn 7, Issue 6, 2004, Pages

  Park, Kee Chan ^a   Nam, Woo Jin ^a   Kang, Su Hyuk ^a   Han, Min Koo ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPUTER SIMULATION; DOPING (ADDITIVES); LASER BEAM EFFECTS; POLYSILICON; TRANSMISSION ELECTRON MICROSCOPY;

DRAIN JUNCTIONS; ENERGY DENSITY; LASER ENERGY; LASER INTENSITY;

THIN FILM TRANSISTORS;

EID: 2642574312     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1695538     Document Type: Article

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