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Volumn 82, Issue 2, 2005, Pages 129-135

Profile control in high aspect ratio contact hole etching by a capacitively coupled plasma source

Author keywords

Capacitively coupled plasma; Contact hole etching; High aspect ratio; Vertical profile

Indexed keywords

ASPECT RATIO; EMISSION SPECTROSCOPY; EXTRACTION; MASKS; PHOTORESISTS; POLYMERS; POLYSILICON;

EID: 25444531737     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.07.001     Document Type: Article
Times cited : (7)

References (8)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.