Formation of titanium nitride films by energetic cluster impact deposition

Thin Solid Films

Volumn 335, Issue 1-2, 1998, Pages 59-63

  Yu, Guoqing ^a   Chen, Jingsheng ^a,b   Shi, Ying ^a   Pan, Haochang ^a   Zhu, Dezhang ^a   Xu, Hongjie ^a   Zheng, Zhihao ^c  

^a INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

^b LANZHOU UNIVERSITY   (China)

^c EAST CHINA NORMAL UNIVERSITY   (China)

Author keywords

Proton elastic scattering; Rutherford backscattering spectrometry; Titanium nitride; X ray diffraction

Indexed keywords

DEPOSITION; FILM GROWTH; IMPURITIES; PRESSURE EFFECTS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; SUBSTRATES; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS;

ENERGETIC CLUSTER IMPACT DEPOSITION (ECID); PROTON ELASTIC SCATTERING (PES);

THIN FILMS;

EID: 0032320525     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0040-6090(98)00886-4     Document Type: Article

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