Simulation study of process latitude for liquid immersion lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 3, Issue 1, 2004, Pages 52-60

  Baek, So Yeon ^a   Cole, Daniel C ^a   Rothschild, Mordechai ^b   Switkes, Michael ^b   Yeung, Michael S ^a   Barouch, Eytan ^a  

^a BOSTON UNIVERSITY   (United States)

^b MIT LINCOLN LABORATORY   (United States)

Author keywords

Liquid immersion; Microelectronics; Microlithograhpy; Nanolithograpy; Simulation

Indexed keywords

LIQUID IMMERSION; OBJECTIVE LENS; OPTICAL PROJECTION; PROCESS LATITUDE;

COMPUTER SIMULATION; LENSES; LIQUIDS; MASKS; MICROELECTRONICS; NANOTECHNOLOGY; PHOTORESISTORS; POLARIZATION; REFRACTION; TEMPERATURE CONTROL; THIN FILMS;

LITHOGRAPHY;

EID: 2542479935     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1637365     Document Type: Article

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