Dynamic studies of hard pellicle response during exposure scanning

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2995-2999

  Cotte, Eric P ^a   Abdo, Amr Y ^a   Engelstad, Roxann L ^a   Lovell, Edward G ^a  

^a Wisconsin Electric Machines and Power Electronics Consortium   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACCELERATION; COMPUTER SIMULATION; FINITE ELEMENT METHOD; FLUID STRUCTURE INTERACTION; FUSED SILICA; IMAGE ANALYSIS; REFRACTION; THICKNESS MEASUREMENT;

INERTIA EFFECTS; MASK RELATED DISTORTIONS; PELLICLE;

LITHOGRAPHY;

EID: 0036883217     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1520573     Document Type: Article

References (5)

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3. E. Cotte, R. Engelstad, E. Lovell, Y. Shkel, F. Eschbach, E. Shu, D. Tanzil, and R. Calhoun, Microelectron. Eng. 61-62, 187 (2002).
4. E. Cotte, R. Engelstad, E. Lovell, Y. Shkel, F. Eschbach, E. Shu, D. Tanzil, and R. Calhoun, Proc. SPIE 4562, 641 (2001).
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