Genetic algorithms to improve mask and illumination geometries in lithographic imaging systems

Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics)

Volumn 3005, Issue , 2004, Pages 208-218

  Fühner, Tim ^a   Erdmann, Andreas ^a   Farkas, Richárd ^b   Tollkühn, Bernd ^a   Kókai, Gabriella ^b  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

GENETIC ALGORITHMS; PHOTOLITHOGRAPHY;

FITNESS FUNCTIONS; ILLUMINATION GEOMETRY; IMAGING CONDITIONS; LITHOGRAPHIC IMAGING SYSTEMS; LITHOGRAPHIC PROCESS; MANUFACTURABILITY; OPTICAL PROJECTIONS; PRIORI KNOWLEDGE;

ALGORITHMS;

EID: 35048846608     PISSN: 03029743     EISSN: 16113349     Source Type: Book Series    
DOI: 10.1007/978-3-540-24653-4_22     Document Type: Article

References (11)

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