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Volumn 5558, Issue PART 1, 2004, Pages 29-40

Genetic algorithms for geometry optimization in lithographic imaging systems

Author keywords

Automatic Optimization; Genetic Algorithms; Resolution Enhancement Techniques

Indexed keywords

ARRAYS; COMPUTATIONAL GEOMETRY; GENETIC ALGORITHMS; LITHOGRAPHY; MASKS; OPTICAL RESOLVING POWER; OPTIMIZATION; PROBLEM SOLVING; PROJECTION SYSTEMS;

EID: 14944369973     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.560085     Document Type: Conference Paper
Times cited : (10)

References (8)
  • 2
    • 0003973518 scopus 로고    scopus 로고
    • Resolution enhancement techineques in optical lithography
    • SPIE Press
    • A. K. Wong, "Resolution Enhancement Techineques in Optical Lithography," in Tutorial Texts in Optical Engineering, TT47, SPIE Press, 2001.
    • (2001) Tutorial Texts in Optical Engineering , vol.TT47
    • Wong, A.K.1
  • 4
    • 0032652497 scopus 로고    scopus 로고
    • Resolution enhancement through optical proximity correction and stepper parameter optimization for 0.12-μm mask pattern
    • Y. Oh, J. Lee, and S. Lim, "Resolution enhancement through optical proximity correction and stepper parameter optimization for 0.12-μm mask pattern," in Proc. SPIE 3679, pp. 607-613, 1999.
    • (1999) Proc. SPIE , vol.3679 , pp. 607-613
    • Oh, Y.1    Lee, J.2    Lim, S.3
  • 7
    • 3843087204 scopus 로고    scopus 로고
    • Towards automatic mask and source optimization for optical lithography
    • in print
    • A. Erdmann, T. Fühner, T. Schnattinger, and B. Tollkühn, "Towards Automatic Mask and Source Optimization for Optical Lithography," in Proc. SPIE 5377, 2004. in print.
    • (2004) Proc. SPIE , vol.5377
    • Erdmann, A.1    Fühner, T.2    Schnattinger, T.3    Tollkühn, B.4
  • 8
    • 35048846608 scopus 로고    scopus 로고
    • Genetic algorithms to improve mask and illumination geometries in lithographic imaging systems
    • R. et al., ed.
    • T. Fühner, A. Erdmann, R. Farkas, B. Tollkühn, and G. Kókai, "Genetic algorithms to improve mask and illumination geometries in lithographic imaging systems," in Evo Workshops 2004, R. et al., ed., pp. 208-217, 2004.
    • (2004) Evo Workshops 2004 , pp. 208-217
    • Fühner, T.1    Erdmann, A.2    Farkas, R.3    Tollkühn, B.4    Kókai, G.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.