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Applied Physics A: Materials Science and Processing

Volumn 81, Issue 7, 2005, Pages 1431-1434

Thermal stability and dielectric properties of ultrathin CaZrOx films prepared by pulsed laser deposition

(6) Qiu, X Y a,b Liu, H W a,b Fang, F a,b Ha, M J a,b Zhou, X H a,b Liu, J M a,b

a NANJING UNIVERSITY (China)

b INTERNATIONAL CENTRE FOR MATERIALS PHYSICS (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; CALCIUM COMPOUNDS; CRYSTALLIZATION; DIELECTRIC PROPERTIES; FIELD EFFECT TRANSISTORS; HIGH RESOLUTION ELECTRON MICROSCOPY; LASER BEAMS; LEAKAGE CURRENTS; MOS DEVICES; PULSED LASER DEPOSITION; SILICON; THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CRYSTALLIZATION TEMPERATURE; DIFFERENTIAL THERMAL ANALYSIS (DTA); MIM STRUCTURE;

THIN FILMS;

EID: 24944543536 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-004-3147-3 Document Type: Article

Times cited : (16)

References (14)

1
- 84857058270
- See the International Technology Roadmap for Semiconductors (2003 edn.) at http://public.itrs.net
- International Technology Roadmap for Semiconductors (2003 Edn.)

2
- 0036122199
- S.-H. Jeon, H.-S. Hwang: J. Vac. Sci. Technol. B 20, 400 (2002)
- (2002) J. Vac. Sci. Technol. B , vol.20 , pp. 400
- Jeon, S.-H.¹ Hwang, H.-S.²

3
- 79955989385
- K. Muraoka: Appl. Phys. Lett. 80, 4516 (2002)
- (2002) Appl. Phys. Lett. , vol.80 , pp. 4516
- Muraoka, K.¹

4
- 0030291621
- K.J. Hubbard, D.G. Schlom: J. Mater. Res. 11, 2757 (1996)
- (1996) J. Mater. Res. , vol.11 , pp. 2757
- Hubbard, K.J.¹ Schlom, D.G.²

5
- 24944518877
- Y.W. Kwon, D.P. Norton, G.E. Jellison: Solid-State Electron. 47, 2194 (2003)
- (2003) Solid-state Electron. , vol.47 , pp. 2194
- Kwon, Y.W.¹ Norton, D.P.² Jellison, G.E.³

6
- 3042715207
- Institute of Physics Publish Bristol and Philadelphia
- M. Houssa: High-k gate dielectric (Institute of Physics Publish Bristol and Philadelphia 2004)
- (2004) High-k Gate Dielectric
- Houssa, M.¹

7
- 0028756974
- R. Rios, N.D. Arora: Tech. Dig. Int. Electron Devices Meet. 1994, 613 (1994)
- (1994) Tech. Dig. Int. Electron Devices Meet. , vol.1994 , pp. 613
- Rios, R.¹ Arora, N.D.²

8
- 16344375839
- J. Zhu, Z.G. Liu: Appl. Phys A 78, 741 (2004)
- (2004) Appl. Phys A , vol.78 , pp. 741
- Zhu, J.¹ Liu, Z.G.²

9
- 0042377613
- K. Kobayashi, M. Yabashi, Y. Takata, T. Tokushima, S. Shin, K. Tamasaku, D. Miwa, T. Ishikawa, H. Nohira, T. Hattori, Y. Sugita, O. Nakatsuka, A. Sakai, S. Zaima: Appl. Phys. Lett. 83, 1005 (2003)
- (2003) Appl. Phys. Lett. , vol.83 , pp. 1005
- Kobayashi, K.¹ Yabashi, M.² Takata, Y.³ Tokushima, T.⁴ Shin, S.⁵ Tamasaku, K.⁶ Miwa, D.⁷ Ishikawa, T.⁸ Nohira, H.⁹ Hattori, T.¹⁰ Sugita, Y.¹¹ Nakatsuka, O.¹² Sakai, A.¹³ Zaima, S.¹⁴

10
- 0003459529
- Physical Electron Division C
- C.D. Wagner, W.M. Riggs, L.E. Davis, J.F. Moulder: Handbook of X-ray Photoelectron Spectroscopy (Physical Electron Division C 1995)
- (1995) Handbook of X-ray Photoelectron Spectroscopy
- Wagner, C.D.¹ Riggs, W.M.² Davis, L.E.³ Moulder, J.F.⁴

11
- 0001459359
- T.S. Jeon, J.M. White, D.L. Kwong: Appl. Phys. Lett. 78, 368 (2001)
- (2001) Appl. Phys. Lett. , vol.78 , pp. 368
- Jeon, T.S.¹ White, J.M.² Kwong, D.L.³

12
- 0032679052
- K.J. Yang, C.M. Hu: IEEE Trans. Electron Devices 46, 1500 (1999)
- (1999) IEEE Trans. Electron Devices , vol.46 , pp. 1500
- Yang, K.J.¹ Hu, C.M.²

13
- 0042029639
- J. Petry, O. Richard, W Vandervorst, T. Conard, J. Chen, V. Cosnier: J. Vac. Sci. Technol. A 21, 1482 (2003)
- (2003) J. Vac. Sci. Technol. A , vol.21 , pp. 1482
- Petry, J.¹ Richard, O.² Vandervorst, W.³ Conard, T.⁴ Chen, J.⁵ Cosnier, V.⁶

14
- 0039436914
- M.L. Green, E.P. Gusev, R. Degraeve, E.L. Garfunkel: J. Appl. Phys. 90, 2057 (2001)
- (2001) J. Appl. Phys. , vol.90 , pp. 2057
- Green, M.L.¹ Gusev, E.P.² Degraeve, R.³ Garfunkel, E.L.⁴

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