Arrays of widely spaced atomic steps on Si(1 1 1) mesas due to sublimation

Surface Science

Volumn 591, Issue 1-3, 2005, Pages 133-141

  Chang, Kee Chul ^a,b   Blakely, Jack M ^a  

^a Cornell University   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

Atomic force microscopy; Computer simulations; Silicon; Single crystal surfaces; Step formation and bunching

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; COMPUTER SIMULATION; DEPOSITION; SUBLIMATION;

CRATERS; SELF-ORGANIZATION; SINGLE CRYSTAL SURFACES; STEP FORMATION AND BUNCHING;

SILICON;

EID: 24944502627     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2005.06.087     Document Type: Article

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