BaTi 4O 9 thin films for high-performance metal-insulator-metal capacitors

Applied Physics Letters

Volumn 87, Issue 11, 2005, Pages

  Jang, Bo Yun ^a   Kim, Beom Jong ^a   Lee, Suk Jin ^a   Lee, Kyong Jae ^a   Nahm, Sahn ^a   Sun, Ho Jung ^b   Lee, Hwack Joo ^c  

^a Korea University   (South Korea)

^b Kunsan National University   (South Korea)

^c Korea Research Institute of Standards and Science   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE DENSITY; LEAKAGE CURRENT DENSITY; TEMPERATURE COEFFICIENT;

CAPACITANCE; CAPACITORS; CURRENT DENSITY; ELECTRIC INSULATORS; ELECTRIC POTENTIAL; MIM DEVICES; THIN FILMS;

BARIUM COMPOUNDS;

EID: 24944478243     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2048827     Document Type: Article

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