Fabrication and characterization of bolometric oxide thin film based on vanadium-tungsten alloy

Sensors and Actuators, A: Physical

Volumn 123-124, Issue , 2005, Pages 660-664

  Han, Yong Hee ^a,b   Kim, Kun Tae ^a   Chi Anh, Nguyen ^a   Shin, Hyun Joon ^a   Choi, In Hoon ^b   Moon, Sung ^a  

^a Korea Institute of Science and Technology   (South Korea)

^b Korea University   (South Korea)

Author keywords

Microbolometer; Oxidation; TCR; Vanadium tungsten alloy

Indexed keywords

BOLOMETERS; CHEMICAL VAPOR DEPOSITION; ETCHING; OXIDATION; PHOTOLITHOGRAPHY; SPUTTERING; VANADIUM ALLOYS;

BOLOMETRIC MATERIALS; BOLOMETRIC PROPERTIES; MICROBOLOMETERS; TEMPERATURE COEFFICIENT OF RESISTANCE (TCR);

THIN FILMS;

EID: 24944438539     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2005.01.024     Document Type: Conference Paper

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