Impact of averaging of CD-SEM measurements on process stability in a full volume DRAM production environment

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue II, 2005, Pages 711-719

  Marschner, Thomas ^a   Kramer, Uwe ^a   Lee, Anice ^a   Stief, Christian ^b  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b Applied Materials   (Germany)

Author keywords

CD Metrology; CD Uniformity; CD SEM; Process Stability

Indexed keywords

DYNAMIC RANDOM ACCESS STORAGE; LITHOGRAPHY; MEASUREMENT THEORY; RANDOM PROCESSES;

PILOT TESTS; PROCESS STABILITY; RANDOM VARIATIONS; TOOL PRECISION;

SCANNING ELECTRON MICROSCOPY;

EID: 24644512220     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.598426     Document Type: Conference Paper

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