Comparative study of resolution limiting factors in electron beam lithography using the edge roughness evaluation method

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2488-2493

  Yoshizawa, Masaki ^a   Moriya, Shigeru ^a  

^a Sony Corporation Semiconductor Network Company   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; MONTE CARLO METHODS; NUMERICAL METHODS; OPTICAL RESOLVING POWER; SURFACE ROUGHNESS;

EDGE ROUGHNESS EVALUATION METHOD; LOW ENERGY ELECTRON BEAM PROXIMITY PROJECTION LITHOGRAPHY; RESOLUTION LIMITING FACTOR;

ELECTRON BEAM LITHOGRAPHY;

EID: 0035519147     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1410087     Document Type: Article

References (14)

1. H. C. Pfeiffer, Proc. SPIE 3997, 206 (2000).
2. S. T. Stanton, J. A. Liddle, J. A. Felker, W. K. Waskiewicz, and L. R. Harriott, Proc. SPIE 3676, 194 (1999).
3. S. D. Berger and J. M. Gibson, Appl. Phys. Lett. 57, 153 (1990).
4. T. Yamaguchi, Jpn. J. Appl. Phys., Part 1 36, 6897 (2000).
5. T. Utsumi, Jpn. J. Appl. Phys., Part 1 38, 7046 (1999).
6. M. A. McCord and T. H. Newman, J. Vac. Sci. Technol. B 10, 3083 (1992).
7. Y. H. Lee, R. Browning, N. Malouf, G. Owen, and R. F. Pease, J. Vac. Sci. Technol. B 10, 3094 (1992).
8. P. A. Peterson, Z. J. Randzimski, S. A. Schwalm, and P. E. Russell, J. Vac. Sci. Technol. B 10, 3088 (1993).
9. M. Yoshizawa and S. Moriya, J. Vac. Sci. Technol. B 17, 3105 (2000).
10. M. Yoshizawa and S. Moriya, presented at Photomask Japan, 2001.
11. M. Yoshizawa and S. Moriya, J. Vac. Sci. Technol. B (submitted).
12. K. Asakawa, T. Ushirogouchi, and M. Nakase, J. Vac. Sci. Technol. B 13, 833 (1995).
13. K. Elian, M. Irmscher, J. Butschke, F. Letzkus, C. Reuter, and R. Springer, J. Vac. Sci. Technol. B 17, 3122 (1999).
14. I. Satou, M. Watanabe, H. Watanabe, and T. Itani, Jpn. J. Appl. Phys., Part 1 39, 6966 (2000).