High numerical aperture-imaging implications for chemically amplified photoresists

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4690 I, Issue , 2002, Pages 351-356

  Sanchez, Martha I ^a   Houle, Frances A ^a   Hoffnagle, John A ^a   Brunner, Timothy A ^b   Hinsberg, William D ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b IBM   (United States)

Author keywords

Aerial image; Brewster s angle; High numerical aperture; Interferometric lithography; Polarization

Indexed keywords

ANTIREFLECTION COATINGS; IMAGING TECHNIQUES; LIGHT ABSORPTION; LIGHT POLARIZATION; SCANNING ELECTRON MICROSCOPY;

HIGH NUMERICAL APERTURE;

PHOTORESISTS;

EID: 0036028781     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474233     Document Type: Article

References (12)

1. T.A. Brunner, N. Seong, W.D. Hinsberg, J.A. Hoffnagle, F.A. Houle, and M.I. Sanchez, SPIE Optical Microlithography XV, 2002.
2. J.A. Hoffnagle, W.D. Hinsberg, M. Sanchez, and F.A. Houle, J. Vac. Sci. Technol. (B), 17(6), 3306 (1999).
3. D.G. Flagello and T.D. Milster, Applied Optics, 36(34), 8944 (1997).
4. W. Hinsberg, F.A. Houle, J. Hoffnagle, M. Sanchez, G. Wallraff, M. Morrison, and S. Frank, J. Vac. Sci. Technol. B, 16(6), 3689 (1998).
5. W. Hinsberg, J. Hoffnagle, F. Houle, H. Ito, M. Sanchez, M. Sherwood, and G. Wallraff, Microlithography World, 9, 16, (2000).
6. F.A. Houle, W.D. Hinsberg, M. Morrison, M.I. Sanchez, G. Wallraff, C. Larson, and J. Hoffnagle, J. Vac. Sci. Technol. B, 18, 1874 (2000).
7. F.A. Houle, W.D. Hinsberg, M.I. Sanchez and J.A. Hoffnagle, J. Vac. Sci. Technol. B, submitted 2001.
8. W.D. Hinsberg, F.A. Houle, M.I. Sanchez, M.E. Morrison, G.M. Wallraff, C.E. Larson, J.A. Hoffnagle, P.J. Brock, G. Breyta, Proc. SPIE, Advances in Resist Technology and Processing XVII, 3999, 148 (2000).
9. W. Hinsberg, F. Houle, M. Sanchez and G. Wallraff, IBM Journal of Research and Development, 45, 667 (2001).
10. L.W. Flanagin, C.L. McAdams, W.D. Hinsberg, I.C. Sanchez and C.G. Willson, Macromolecules 32, 5337 (1999).
11. L.W. Flanagin, V.K. Singh and C.G. Willson, J. Polym. Sci. B Polym. Phys. 37, 2103 (1999).
12. F.A. Houle, W.D. Hinsberg and M.I. Sanchez, to be published (2002).