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Journal of Photopolymer Science and Technology

Volumn 17, Issue 4, 2004, Pages 603-607

Development status of high performance materials for immersion lithography

(4) Yoshida, Masaaki a Endo, Kotaro a Ishizuka, Keita a Sato, Mitsuru a

a TOKYO OHKA KOGYO CO LTD (Japan)

Author keywords

Cover material; Elution; Immersion lithography; Water

Indexed keywords

ACID; AMINE; THINNER;

ANALYTIC METHOD; AQUEOUS SOLUTION; ARTICLE; CHEMICAL ANALYSIS; CHEMICAL REACTION; CHEMICAL STRUCTURE; DEVICE; ELECTRON BEAM; ELUTION; EVALUATION; IMAGING SYSTEM; IMMERSION LITHOGRAPHY; LIQUID; MATERIAL COATING; MOLECULAR WEIGHT; OPTICS; PARAMETER; PERFORMANCE; PHYSICOCHEMICAL MODEL; SEMICONDUCTOR; SYNTHESIS; TECHNIQUE; TEMPERATURE DEPENDENCE;

EID: 3142582525 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.17.603 Document Type: Article

Times cited : (19)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.