A novel contact hole shrink process for the 65-nm-node and beyond

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue I, 2005, Pages 195-205

  Peters, Richard ^a   Montgomery, Patrick ^a   Garza, Cesar ^a   Filipiak, Stan ^a   Stephens, Tab ^a   Babbitt, Dan ^a  

^a FREESCALE SEMICONDUCTOR INC   (United States)

Author keywords

193nm; 248nm; Bilayer; Contacts; Resist; Shrink

Indexed keywords

193NM; 248NM; BILAYER; MANUFACTURABLE PROCESS; SHRINK;

COSTS; OPTICAL RESOLVING POWER; PHOTOLITHOGRAPHY; REDUCTION; SENSITIVITY ANALYSIS; THERMAL EFFECTS;

SHRINKAGE;

EID: 24644470446     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599918     Document Type: Conference Paper

References (8)

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