Realization of sub-80nm small space patterning in ArF photolithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 2, 2004, Pages 1082-1090

  Kim, Si Hyun ^a   Kim, Hyung Do ^a   Lee, Si Hyeung ^a   Park, Chang Min ^a   Ryoo, Man Hyoung ^a   Yeo, Gi Sung ^a   Lee, Jung Hyeon ^a   Cho, Han Ku ^a   Han, Woo Sung ^a   Moon, Joo Tae ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

RELACS; Resist thermal flow process; SAFIER; Small space patterning

Indexed keywords

AMMONIA; CONTAMINATION; DEGRADATION; THERMOANALYSIS; THIN FILMS;

RELACS; RESIST THERMAL FLOW PROCESS; SAFIER; SMALL SPACE PATTERING;

PHOTOLITHOGRAPHY;

EID: 3843137155     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536340     Document Type: Conference Paper

References (3)

1. Hyung-Do Kim, Si-Hyeung Lee, Sang-Jun Choi, Jung-Hyeon Lee, Han-Ku Cho, Woo-Sung Han, Joo-Tae Moon, "What an anti-shrinkage coating method can surmount among stumbling block of ArF resists", proc. SPIE 5039, 827 (2003).
2. R. Dellaguardia, K. Petrllo, J. Chen, P. Rabioux, T. Dalton, S. Holmes, L. Hadel, K. Maltone, A. Mahorowala, S. Greco, and R. Ferguson, "193 lithography and RELACS processing for BEOL lithography", proc. SPIE 4346, 1029 (2001).
3. Patrick Montgomery, Kevin Lucas, Kirk Strozewski, Lena Zavyalova, Grozdan Grozev, Mario Reybrouck, Plamen Tzviatkov, Mireille Maenhoudt, "Resist Reflow for 193nm Low K1 Lithography Contacts", proc. SPIE 5039, 807 (2003).