Micromolar concentrations of base quenchers impact the apparent efficiency of photoacid generation in chemically amplified resists

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 5, 2002, Pages 2162-2168

  Pawloski, Adam R ^a   Christian, ^a   Nealey, Paul F ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; ALCOHOLS; AMPLIFICATION; COMPOSITION; DECOMPOSITION; DISSOLUTION; INFRARED SPECTROSCOPY; IONIZING RADIATION; MONOMERS; ORGANIC ACIDS; PHOTOCHEMICAL REACTIONS; QUENCHING;

BASE QUENCHERS; MICROMOLAR CONCENTRATIONS; PHOTOACID GENERATION; PIPERIDINEETHANOL;

PHOTORESISTS;

EID: 0036026401     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1511217     Document Type: Article

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