Wafer alignment with backscatter electron detection

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 II, Issue , 2003, Pages 1100-1111

  Gijsbertsen, Hans ^a   Nijkerk, David ^a   Derksen, Giljam ^a   De Jager, Patrick ^a,b   Keij, Stefan ^b   Van Der Schaar, Maurits ^b  

^a TNO   (Netherlands)

^b ASML   (Netherlands)

Author keywords

Alignment; Cu damascene; Electron backscattering; Process induced alignment offset; Scanning electron microscope; W CMP

Indexed keywords

BACKSCATTERING; COMPUTER SIMULATION; LIGHTING; MAGNETIC FIELDS; OPTICAL SENSORS; SCANNING ELECTRON MICROSCOPY;

BACKSCATTER ELECTRON DETECTION; WAFER ALIGNMENT;

ELECTRON BEAMS;

EID: 0141612821     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.484962     Document Type: Conference Paper

References (4)

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